著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tsukasa Azuma and Shoji Mimotogi and Yasunobu Onishi and Kentaro Matsunaga and Daisuke Kawamura,Resist Development Process For Sub-0.15/spl mu/m Lithography By KrF Imaging,Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135),,IEEE,1998-01-01,,,319-320,https://cir.nii.ac.jp/crid/1873398392698726144,https://doi.org/10.1109/imnc.1998.730101