著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hiroshi Mohri and Hiroyuki Miyashita and Naoya Hayashi and Koichi Mikami and Norihito Itoh and Hisatake Sano,
Development of the halftone phase-shift mask for DUV exposure,SPIE Proceedings,0277-786X,SPIE,1996-12-27,2884,,228-242,https://cir.nii.ac.jp/crid/1873398392898433152,https://doi.org/10.1117/12.262835