Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Tadaaki Nagao and Zilong Wu and Kai Chen and Satoshi Ishii and Bharath Bangalore Rajeeva and Masakazu Aono and Yuebing Zheng and Michael Rukavina and Thang Duy Dao,Moiré nanosphere lithography: use colloidal moiré patterns as masks,SPIE Proceedings,0277-786X,SPIE,2015-08-28,9547,,95471L,https://cir.nii.ac.jp/crid/1873679867269367680,https://doi.org/10.1117/12.2187398