Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI) Y. Maeda and M. Endo and Michio Niwano and H. Yoshida and N. Miyamoto,A novel IR monitoring system for organic contaminants on 300-mm silicon wafer surfaces,1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314),,IEEE,2003-01-20,,,457-460,https://cir.nii.ac.jp/crid/1873679867529123968,https://doi.org/10.1109/issm.1999.808835