Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Makoto Konagai and Katsuya Abe and Akira Yamada and Tatsuro Watahiki,Analysis of Radical Reaction on Growing Surface During Si Epitaxy by Photo-Cvd,MRS Proceedings,0272-9172,Springer Science and Business Media LLC,1998-01-01,507,,,https://cir.nii.ac.jp/crid/1873679867542242560,https://doi.org/10.1557/proc-507-423