著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Makoto Konagai and Katsuya Abe and Akira Yamada and Tatsuro Watahiki,Analysis of Radical Reaction on Growing Surface During Si Epitaxy by Photo-Cvd,MRS Proceedings,0272-9172,Springer Science and Business Media LLC,1998-01-01,507,,,https://cir.nii.ac.jp/crid/1873679867542242560,https://doi.org/10.1557/proc-507-423