著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Takashi Itoh and Norimitsu Yoshida and Takahiro Kawasaki and Shuichi Nonomura and Yuta Takai,Properties of hetero-structured SiCX films deposited by hot-wire CVD using SiH3CH3 as carbon source,Thin Solid Films,0040-6090,Elsevier BV,2008-01-01,516,,641-643,https://cir.nii.ac.jp/crid/1873679867566221696,https://doi.org/10.1016/j.tsf.2007.06.221