著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
J.C. Bea and T. Hirosue and Hyuckjae Oh and J. Sim and Hiroyuki Kurino and Hoon Choi and Mitsumasa Koyanagi,Ultra-shallow junction formed using laser annealing for sub-50 nm MOS devices,Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C),,Japan Soc. Appl. Phys,2002-11-14,,,95-98,https://cir.nii.ac.jp/crid/1873961342507444864,https://doi.org/10.1109/iwjt.2001.993836