著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nobuyoshi Takahashi and Hiroki Ishikuro and Eiji Nagata and Toshiro Hiramoto,Characteristics distribution of narrow channel MOSFET memories with silicon nano-crystal floating gates,Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference,,Japan Society of Applied Physics,2003-01-20,,,86-87,https://cir.nii.ac.jp/crid/1874242817396086400,https://doi.org/10.1109/imnc.1999.797489