著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kohji Hashimoto and Shinji Yamaguchi and Takahiro Ikeda and Masamitsu Itoh and Shogo Narukawa and Eiji Yamanaka and Mitsuyo Kariya and Tsukasa Kawashima and Hideaki Kobayashi and Satoshi Tanaka,Mask pattern quality assurance based on lithography simulation with fine pixel SEM image,SPIE Proceedings,0277-786X,SPIE,2005-10-21,5992,,59921M,https://cir.nii.ac.jp/crid/1874242817499302272,https://doi.org/10.1117/12.632611