著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nazneen Jeewakhan and Joshua Broussard and Dianna Coburn and Dongsung Hong and Shengqi Xie and Curt Jackson and Larry Martinez and Peter D. Buck and Prakash Krishnan and Kent G. Green and Bradley A. Ferguson,DUV mask writer for BEOL 90-nm technology layers,SPIE Proceedings,0277-786X,SPIE,2003-12-15,5256,,9,https://cir.nii.ac.jp/crid/1874242817882125824,https://doi.org/10.1117/12.518051