URL,博士論文名,著者名,学位授与大学名,学位授与年,学位授与番号,取得学位名,DOI,URL(DOI)
https://cir.nii.ac.jp/crid/1920302385021875968,High rate growth and characterization of crystalline silicon films from inductively-coupled SiH4 plasma,"Kosku, Nihan",広島大学,2005,甲第3717号,博士 (工学),,