[Updated on July 12] Integration of CiNii Articles into CiNii Research from April 1, 2022

Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique

Bibliographic Information

Title
Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
Author
H.Ishizaki, Y.Otani, Y.Fukuda, T.Sato, T.Takamatsu, T.Ono

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Details

  • CRID
    1010000782045180939
  • Article Type
    journal article
  • Data Source
    • KAKEN
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