[Updated on July 12] Integration of CiNii Articles into CiNii Research from April 1, 2022

Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode

Bibliographic Information

Title
Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode
Author
H. Kakiuchi, H. Ohmi, T. Yamada, K. Yokoyama, K. Okamura, and K. Yasutake

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Details

  • CRID
    1010282257030396545
  • Article Type
    journal article
  • Data Source
    • KAKEN
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