In this study, effects of RF magnetron sputtering with auxiliary permanent magnet were investigated. The auxiliary magnet was installed under the grounded electrode and the magnetic field strength was intensified in whole discharge space. Growth of the rutile TiO_2 films with high refractive index which is equal to bulk TiO_2 crystal was achieved using supposed sputtering apparatus. Mass analysis of substrate- incident ion showed that Ar^+ and O^+ current increased in the discharge with auxiliary magnet. Kinetic energy distribution of substrate-incident Ar^+ shifted to higher energy compared to conventional discharge. The obtained films showed rutile polycrystalline structure and quite fine surface morphology indicating higher densification of the films.