A shock-tracking algorithm for surface evolution under reactive-ion etching
type:学術雑誌論文 Journal Article
S. Hamaguchi et al., Journal of Applied Physics 74, 5172 (1993) https://doi.org/10.1063/1.354282
A new algorithm that determines the evolution of a surface eroding under reactive-ion etching is presented. The surface motion is governed by both the Hamilton-Jacobi equation and the entropy condition for a given etch rate. The trajectories of "shocks" and "rarefaction waves" are then directly tracked, and thus this method may be regarded as a generalization of the method of characteristics. This allows slope discontinuities to be accurately calculated without artificial diffusion. The algorithm is compared with "geometric" surface evolution methods, such as the line-segment method.
- Journal of Applied Physics
Journal of Applied Physics 74 (8), 5172-5184, 1993-10-15
American Institute of Physics Inc.