Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
書誌事項
- タイトル
- Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
- 著者
- Yoshifumi Suzaki, Xiaoyuan Ma, Toshifumi Yuji, Kenzo Yamaguchi
収録刊行物
-
- Frontier of Applied Plasma Technology
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Frontier of Applied Plasma Technology 9 61-65, 2016