Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
Bibliographic Information
- Title
- Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
- Author
- Yoshifumi Suzaki, Xiaoyuan Ma, Toshifumi Yuji, Kenzo Yamaguchi
Journal
-
- Frontier of Applied Plasma Technology
-
Frontier of Applied Plasma Technology 9 61-65, 2016
- Tweet
Details 詳細情報について
-
- CRID
- 1010000781857983106
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN