Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
Bibliographic Information
- Title
- Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
Journal
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- Frontier of Applied Plasma Technology
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Frontier of Applied Plasma Technology 9 61-65, 2016
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Details 詳細情報について
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- CRID
- 1010000781857983106
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- Article Type
- journal article
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- Data Source
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- KAKEN