Effect of Oxygen Radical Irradiation of Bi_4Ti_3O_<12> Thin Films by Two-Dimensional RF Magnetron Sputtering
書誌事項
- タイトル
- Effect of Oxygen Radical Irradiation of Bi_4Ti_3O_<12> Thin Films by Two-Dimensional RF Magnetron Sputtering
- 著者
- N.Inada, T.Higuchi, H.Masaya, H.Ogawa, M.Iwasa, T.Hattori, T.Tsukamoto
収録刊行物
-
- Trans.Mater.Res.Soc.Jpn. 31
-
Trans.Mater.Res.Soc.Jpn. 31 73-76, 2006