Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal-thermal-oxidation separation-by-implanted-oxygen wafers
書誌事項
- タイトル
- Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal-thermal-oxidation separation-by-implanted-oxygen wafers
- 著者
- T.Shimura, K.Fukuda, K.Yasutake, T.Hosoi, M.Umeno
収録刊行物
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- Thin Solid Films 476-1
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Thin Solid Films 476-1 125-129, 2005
