Comparative study of plasma-charging damage in high-k dielectric and P-N junction and their effects on off-state leakage current of metal-oxide-semiconductor field-effect transistors
書誌事項
- タイトル
- Comparative study of plasma-charging damage in high-k dielectric and P-N junction and their effects on off-state leakage current of metal-oxide-semiconductor field-effect transistors
- 著者
- M.Kamei, Y.Takao, K.Eriguchi, K.Ono
収録刊行物
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- Jpn.J.Appl.Phys 50(掲載予定)
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Jpn.J.Appl.Phys 50(掲載予定) 2011
