Effect of Interfacial Reactions in Radical Process on Electrical Properties of Al2O3/Ge Gate Stack Structure
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- 加藤 公彦
- 名古屋大学
書誌事項
- タイトル
- Effect of Interfacial Reactions in Radical Process on Electrical Properties of Al2O3/Ge Gate Stack Structure
- 著者
- 加藤公彦
収録刊行物
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- Journal of Physics : Conference Series
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Journal of Physics : Conference Series (印刷中)(in press) 2012