Fine Fabrication of GaInAsP-InP Photonic Crystal by HI/Xe ICP Etching using Electron Beam Resist Mask
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- 冨士田 誠之
- 京都大学
書誌事項
- タイトル
- Fine Fabrication of GaInAsP-InP Photonic Crystal by HI/Xe ICP Etching using Electron Beam Resist Mask
- 著者
- Masayuki Fujita
収録刊行物
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- Proceeding of International Microprocesses and Nanotechnology Conference
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Proceeding of International Microprocesses and Nanotechnology Conference 2004