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Magnetic Mesa Structures Fabricated by Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer
Bibliographic Information
- Title
- Magnetic Mesa Structures Fabricated by Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer
- Author
- D.R Wang, A.Takahashi, Y.Matsumoto, K.M.Itoh, Y.Yamamoto, T.Ono, M.Esashi
Journal
-
- Nanotechnology 16
-
Nanotechnology 16 990-994, 2005
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Details 詳細情報について
-
- CRID
- 1010282256752247828
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN