Magnetic Mesa Structures Fabricated by Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer
書誌事項
- タイトル
- Magnetic Mesa Structures Fabricated by Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer
- 著者
- D.R Wang, A.Takahashi, Y.Matsumoto, K.M.Itoh, Y.Yamamoto, T.Ono, M.Esashi
収録刊行物
-
- Nanotechnology 16
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Nanotechnology 16 990-994, 2005