Magnetic Mesa Structures Fabricated by Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer

Bibliographic Information

Title
Magnetic Mesa Structures Fabricated by Reactive Ion Etching with CO/NH3/Xe Plasma Chemistry for an All-Silicon Quantum Computer
Author
D.R Wang, A.Takahashi, Y.Matsumoto, K.M.Itoh, Y.Yamamoto, T.Ono, M.Esashi

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Details

  • CRID
    1010282256752247828
  • Article Type
    journal article
  • Data Source
    • KAKEN

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