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A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods
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- TOYOTA Hiromichi
- Ehime University
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- NOMURA Shinfuku
- 愛媛大学
Bibliographic Information
- Title
- A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods
- Author
- Yoshiyuki Takahashi, Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa, Toru Inoue
Journal
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- JOURNAL OF APPLIED PHYSICS 105
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JOURNAL OF APPLIED PHYSICS 105 2009
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Details 詳細情報について
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- CRID
- 1010282257012344577
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- Article Type
- journal article
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- Data Source
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- KAKEN