Influence of γ-Irradiation on Thin Metal Film Resistors

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  • 金属薄膜抵抗に対するγ線照射の影響
  • キンゾク ハクマク テイコウ ニ タイスル ガンマセン ショウシャ ノ エイキ

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Description

The vacuum evaporated films of the alloy nickrom with a bulk composition; Ni80%-Cr20%, and those of the nickel were exposed to γ-rays emitted from Co^<60> at an ambient temperature. These films were deposited on to glass substrate at temperature 350℃, and in a vacuum of 1×10^<-5>Torr. The dependence on temperature of resistance of these films was measured as a function of temperature, pre- and post-irradiation. The range of temperature measurement was from -20℃ to +80℃ on the nickrom films, and from -10℃ to +80℃ on the nickel films. The dependence on temperature of resistance after irradiation agreed closly to that of post-irradiation. The film's resistance increased with the temperature, including pre- and post-irradiation. The increase in resistance after irradiation was below 0.1%, except for a small number of sampls. Difference in the resistance changes between 10^6r and 10^7r was very small. It is conclded from the experiment described above that metal film's resistance has little change, that is to say, is of no material effect in practical use, when the radiated dose is below 10^7r.

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