Adsorption of Methylchloride Molecule on GaAs(001)-2x4 Surface

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  • GaAs (001) 表面における塩化メチル分子の吸着過程
  • GaAs 001 ヒョウメン ニ オケル エンカ メチル ブンシ ノ キュウチャク カテイ

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Abstract Adsorption process of methylchloride (CH3Cl) on GaAs(OO1) surface was studied by a scanning tunneling microscopy (STM) measurement. The arsenic rich 2x4 surface, which was prepared by molecular beam epitaxy (MBE), was exposed by CH3Cl at room temperature. A Iarge amount of adsorbates were observed in the STM image. It was suggested that CH3Cl molecule was preferentially adsorbed on B step on GaAs(OO1)-2x4 surface. The adsorption of CH3Cl molecule was also studied by ACF Hatree-Fock calculation, which well explained the CH3Cl adsorption model.

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