Effect of Heat Treatment on Ion Conductivity of Hydrated ZrO2 Thin Films Prepared by Reactive Sputtering Using H2O Gas
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Hydrated ZrO2 thin films were prepared by reactive sputtering using H2O gas, and these films were heat treated in air at temperatures from 100 to 350 °C. Absorbance peaks due to hydrogen-bonded OH groups for these samples were observed by Fourier transform infrared spectroscopy. The peak intensities were nearly the same before and after heat treatment below 200 °C, but began to decrease at 250 °C, and the absorption peak disappeared at 350 °C. Ion conductivity of the films was evaluated by AC impedance measurements and was found to be about 3 ×10-6 S/m before and after heat treatment at 200 °C; it also decreased after heat treatment above 250 °C. From these results, we considered that protons of OH and/or H2O in the films are the dominant ionic species that contribute to the ion conductivity of the films.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 50 (4R), 045804-, 2011
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1050282813785038208
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- NII論文ID
- 120005845003
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- NII書誌ID
- AA12295836
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- ISSN
- 00214922
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- NDL書誌ID
- 11075937
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- 本文言語コード
- en
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- 資料種別
- journal article
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- データソース種別
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- IRDB
- NDL
- CiNii Articles