Anisotropic non-plasma HCl gas etching of (010) β-Ga2O3 substrate

Details 詳細情報について

• CRID

  1050582154146025472

• ISSN

  18820778

• DOI

  10.48505/nims.4267

• Web Site

  https://mdr.nims.go.jp/pid/7454efb6-5194-4d17-bca8-18ba262be36e

• Text Lang

  en

• Article Type

  journal article

• Data Source

  • IRDB