Fabrication of (101)-oriented CsPbBr<sub>3</sub> thick films with high carrier mobility using a mist deposition method

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  • Fabrication of (101)-oriented CsPbBr₃ thick films with high carrier mobility using a mist deposition method

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CsPbBr₃ is a promising candidate for highly sensitive flat-panel X-ray detectors due to its excellent optoelectronic properties. Thus, a method of preparing thick CsPbBr₃ films (>10 μm) over large areas (>10 × 10 cm²) is required. Herein, we report the fabrication of thick CsPbBr₃ films using a scalable mist deposition method. In this method, the film thickness was controlled and up-scaled by the number of deposition cycles. The obtained CsPbBr₃ films were composed of highly (101)-oriented columnar crystals and had a high carrier mobility of 13 cm² V⁻¹ s⁻¹, which is comparable to that for single crystals.

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