Schwoebel effect and dynamic scaling behavior in nickel film growth by electrodeposition
書誌事項
- 公開日
- 1999-07-18
- 資源種別
- journal article
- DOI
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- 10.1016/s0257-8972(99)00253-4
- 公開者
- Elsevier Science S.A.
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説明
Two kinds of growth rate of nickel films prepared by electrodeposition were measured by use of columnar photoresists formed on indium-tin oxide (ITO) glass plates. The ratio of the mean growth rate at the edge to that of the nickel layer was 1.5, which indicates direct evidence for the Schwoebel effect [R.L. Schwoebel, J. Appl. Phys. 40 (1969) 614]; i.e., the presence of anisotropy between the up and down step incorporation probabilities of adatoms. The growth exponent of 0.3 was obtained from atomic force microscopy (AFM) images of the nickel film surface. This suggests that the nickel growth by electrodeposition has a dynamic scaling property.
論文
収録刊行物
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- Surface & Coatings Technology
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Surface & Coatings Technology 115 (2-3), 282-284, 1999-07-18
Elsevier Science S.A.
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詳細情報 詳細情報について
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- CRID
- 1050855676757167232
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- NII論文ID
- 120001371819
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- NII書誌ID
- AA10652003
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- ISSN
- 02578972
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- HANDLE
- 20.500.12000/391
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- 本文言語コード
- en
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- 資料種別
- journal article
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- データソース種別
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- IRDB
- CiNii Articles
- OpenAIRE