New trend in applied plasma science and technology : the seventh International Symposium on Applied Plasma Sciences - ISAPS '09, Hamburg, Germany, 31 August-4 September 2009
Bibliographic Information
- Title
- "New trend in applied plasma science and technology : the seventh International Symposium on Applied Plasma Sciences - ISAPS '09, Hamburg, Germany, 31 August-4 September 2009"
- Statement of Responsibility
- editors Akira Kobayashi, Takeshi Miyasaka, Josef Krasa
- Publisher
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- American Institute of Physics
- Publication Year
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- c2010
- Book size
- 29 cm
- Other Title
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- ISAPS '09
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Notes
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130000794445291008
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- NII Book ID
- BB08377240
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- ISBN
- 9780735408128
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- LCCN
- 2010911819
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- Web Site
- https://lccn.loc.gov/2010911819
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Melville, N.Y.
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- Classification
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- LCC: QC717.6
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- Subject
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- Data Source
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- CiNii Books