Plasma processing of semiconductors

Details 詳細情報について

• CRID

  1130000795948612352

• NII Book ID

  BA31434665

• ISBN

  0792345673

• LCCN

  97016609

• Web Site

  https://lccn.loc.gov/97016609

• Text Lang

  en

• Country Code

  ne

• Title Language Code

  en

• Place of Publication

  • Dordrecht

• Classification

  • LCC: TA2020
  • DC21: 621.3815/2

• Subject

  • LCSH: Plasma engineering
  • LCSH: Semiconductors -- Etching
  • LCSH: Plasma etching -- Industrial applications
  • LCSH: Plasma chemistry -- Industrial applications

• Data Source

  • CiNii Books