Bibliographic Information
- Title
- "Plasma etching : fundamentals and applications"
- Statement of Responsibility
- M. Sugawara ; with contributions from Barry L. Stansfield ... [et al.]
- Publisher
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- Oxford University Press
- Publication Year
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- 1998
- Book size
- 24 cm
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Notes
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130000796106119296
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- NII Book ID
- BA37045123
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- ISBN
- 019856287X
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- LCCN
- 97039210
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- Web Site
- https://lccn.loc.gov/97039210
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- Text Lang
- en
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- Country Code
- uk
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- Title Language Code
- en
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- Place of Publication
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- Oxford
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- Classification
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- LCC: TK7871.85
- DC21: 621.3815/31
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- Subject
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- LCSH: Semiconductors -- Etching
- LCSH: Plasma etching
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- Data Source
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- CiNii Books