Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

Name: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
Author: Data Analysis and Modeling for Process Control (Conference), Emami, Iraj, Ausschnitt, Christopher P., Tobin, Kenneth W., Society of Photo-optical Instrumentation Engineers, International SEMATECH

Data Analysis and Modeling for Process Control (Conference), Emami, Iraj, Ausschnitt, Christopher P., Tobin, Kenneth W., Society of Photo-optical Instrumentation Engineers, International SEMATECH

Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA

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Data Analysis and Modeling for Process Control (Conference)
Emami, Iraj
Ausschnitt, Christopher P.
Tobin, Kenneth W.
Society of Photo-optical Instrumentation Engineers
International SEMATECH

Bibliographic Information

Title: "Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA"

Statement of Responsibility: Iraj Emami, chair/editor ; Christopher P. Ausschnitt, Kenneth W. Tobin, Jr., cochair/editors ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering

Publisher

SPIE

Publication Year

c2005

Book size: 28 cm

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Includes bibliographical references and author index

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