EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
Bibliographic Information
- Title
- "EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany"
- Statement of Responsibility
- Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]
- Publisher
-
- SPIE
- Publication Year
-
- c2006
- Book size
- 28 cm
Search this Book/Journal
Notes
Includes bibliographical references and author index
- Tweet
Details 詳細情報について
-
- CRID
- 1130000797658446208
-
- NII Book ID
- BA85710449
-
- ISBN
- 0819463566
-
- LCCN
- 2006285647
-
- Web Site
- https://lccn.loc.gov/2006285647
-
- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
-
- Bellingham, Wash.,
-
- Subject
-
- Data Source
-
- CiNii Books