EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Web Site CiNii Available at 1 libraries

Bibliographic Information

Title
"EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany"
Statement of Responsibility
Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]
Publisher
  • SPIE
Publication Year
  • c2006
Book size
28 cm

Search this Book/Journal

Notes

Includes bibliographical references and author index

Related Books

See more

Details 詳細情報について

Back to top