Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
Bibliographic Information
- Title
- "Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California"
- Statement of Responsibility
- David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
- Publisher
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- SPIE
- Publication Year
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- c1994
- Book size
- 28 cm
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Notes
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130000798190912256
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- NII Book ID
- BA27423508
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- ISBN
- 0819414891
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- LCCN
- 94065789
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- Web Site
- https://lccn.loc.gov/94065789
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Classification
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- LCC: TK7874
- DC20: 621.3815/31
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- Data Source
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- CiNii Books