Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA

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Bibliographic Information

Title
"Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA"
Statement of Responsibility
Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.
Publisher
  • SPIE
Publication Year
  • c2007
Book size
28 cm
Other Title
  • Optical microlithography 20
  • Optical microlithography twenty

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Notes

Includes bibliographical references and author index

"Part One of Three Parts"--T.p.

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