Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA
Bibliographic Information
- Title
- "Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA"
- Statement of Responsibility
- Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.
- Publisher
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- SPIE
- Publication Year
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- c2007
- Book size
- 28 cm
- Other Title
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- Optical microlithography 20
- Optical microlithography twenty
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Notes
Includes bibliographical references and author index
"Part One of Three Parts"--T.p.
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Details 詳細情報について
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- CRID
- 1130004954236560384
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- NII Book ID
- BC02331492
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- LCCN
- 2010459315
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- Web Site
- https://lccn.loc.gov/2010459315
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Classification
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- LCC: TR940
- DC22: 621.3815/31
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- Subject
-
- Data Source
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- CiNii Books