Bibliographic Information
- Title
- "Photomask fabrication technology"
- Statement of Responsibility
- Benjamin G. Eynon, Jr., Banqiu Wu
- Publisher
-
- McGraw-Hill
- Publication Year
-
- c2005
- Book size
- 24 cm
Search this Book/Journal
Notes
Includes bibliographical references and index
- Tweet
Details 詳細情報について
-
- CRID
- 1130282269728964736
-
- NII Book ID
- BA74317798
-
- ISBN
- 0071445633
-
- LCCN
- 2005047886
-
- Web Site
- https://lccn.loc.gov/2005047886
-
- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
-
- New York
-
- Classification
-
- LCC: TK7872.M3
- DC22: 621.3815/31
-
- Subject
-
- LCSH: Integrated circuits -- Masks
- LCSH: Masks (Electronics)
- LCSH: Microlithography
-
- Data Source
-
- CiNii Books