Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California
Bibliographic Information
- Title
- "Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California"
- Statement of Responsibility
- David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
- Publisher
-
- The Society
- Publication Year
-
- c1993
- Book size
- 28 cm
- Series Name / No
-
- pbk.
Search this Book/Journal
Notes
Includes bibliographical references and index
- Tweet
Details 詳細情報について
-
- CRID
- 1130282269873633408
-
- NII Book ID
- BA27103981
-
- ISBN
- 0819411582
-
- LCCN
- 93084071
-
- Web Site
- https://lccn.loc.gov/93084071
-
- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
-
- Bellingham, Wash.
-
- Classification
-
- LCC: TK7874
- DC20: 621.3815/31
-
- Data Source
-
- CiNii Books