Advances in resist technology and processing VI : 27 February-1 March, 1989, San Jose, California

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Bibliographic Information

Title
"Advances in resist technology and processing VI : 27 February-1 March, 1989, San Jose, California"
Statement of Responsibility
Elsa Reichmanis, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publisher
  • International Society for Optical Engineering
Publication Year
  • c1989
Book size
28 cm

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Notes

Includes bibliographical references and index

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Details 詳細情報について

  • CRID
    1130282270865118592
  • NII Book ID
    BA1268266X
  • ISBN
    0819401218
  • LCCN
    89060656
  • Web Site
    https://lccn.loc.gov/89060656
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Bellingham, Wash., USA
  • Data Source
    • CiNii Books
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