Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

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Bibliographic Information

Title
"Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California"
Statement of Responsibility
Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group
Publisher
  • S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers
Publication Year
  • c1979
Book size
28 cm

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Notes

Proceedings of a seminar

Includes bibliographical references and indexes

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