Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California

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Bibliographic Information

Title
"Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California"
Statement of Responsibility
James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics
Publisher
  • SPIE
Publication Year
  • c1977
Book size
28 cm

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Notes

Includes bibliographical references and indexes

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