Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

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Bibliographic Information

Title
"Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan"
Statement of Responsibility
Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1997
Book size
28 cm
Other Title
  • Photomask and X-ray mask technology 4
  • Photomask and X-ray mask technology four

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Notes

Includes bibliographic references and author index

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