Proceedings of the Second International Symposium on Silicon Molecular Beam Epitaxy
Bibliographic Information
- Title
- "Proceedings of the Second International Symposium on Silicon Molecular Beam Epitaxy"
- Statement of Responsibility
- edited by John C. Bean, Leo J. Schowalter ; assistant editors, Hiroshi Ishiwara, Erich Kasper, Evan H.C. Parker
- Publisher
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- Electrochemical Society
- Publication Year
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- c1988
- Book size
- 23 cm
- Other Title
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- Silicon molecular beam epitaxy II
- Silicon molecular beam epitaxy 2
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Notes
Includes bibliographical references and index
"... held on October 20-23, 1987 in Honolulu, Hawaii as a part of the 172nd Meeting of the Electrochemical Society" -- on pref
Sponsored by: the Electronics and the Dielectrics and Insulation Divisions of the Electrochemical Society
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Details 詳細情報について
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- CRID
- 1130282273193894784
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- NII Book ID
- BA84955371
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- LCCN
- 88080747
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- Web Site
- https://lccn.loc.gov/88080747
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Pennington, NJ
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- Classification
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- LCC: QC611.6.M64
- DC20: 530.4/1
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- Subject
-
- Data Source
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- CiNii Books