Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium

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Bibliographic Information

Title
"Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium"
Statement of Responsibility
editors, M.T. Swihart, M.D. Allendorf, M. Meyyappan
Publisher
  • Electrochemical Society
Publication Year
  • c2001
Book size
24 cm

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Notes

Includes bibliographical references and indexes

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Details 詳細情報について

  • CRID
    1130282273318755712
  • NII Book ID
    BA59006533
  • ISBN
    1566773199
  • LCCN
    2001092515
  • Web Site
    https://lccn.loc.gov/2001092515
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Pennington, N.J.
  • Data Source
    • CiNii Books
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