Hybridization between Periodic Mesoporous Organosilica and a Ru(II) Polypyridyl Complex with Phosphonic Acid Anchor Groups
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- Tatsuto Yui
- Department of Chemistry, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1-NE1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
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- Hiroyuki Takeda
- Department of Chemistry, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1-NE1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
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- Yutaro Ueda
- Department of Chemistry, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1-NE1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
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- Keita Sekizawa
- Department of Chemistry, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1-NE1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
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- Kazuhide Koike
- Department of Chemistry, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1-NE1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
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- Shinji Inagaki
- Toyota Central R&D Laboratories Inc., Yokomichi, Nagakute, Aichi 480-1192, Japan
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- Osamu Ishitani
- Department of Chemistry, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1-NE1 O-okayama, Meguro-ku, Tokyo 152-8550, Japan
書誌事項
- 公開日
- 2014-01-30
- 資源種別
- journal article
- DOI
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- 10.1021/am405065a
- 公開者
- American Chemical Society (ACS)
この論文をさがす
説明
A new method for the hybridization of a ruthenium(II) polypyridyl complex ([Ru(bpy)2((CH2PO3H2)2-bpy)](2+) (RuP2(2+): bpy =2,2'-bipyridine; (CH2PO3H2)2-bpy =2,2'-bipyridine-4,4'di(metylphosphonic acid)) with biphenylene-bearing periodic mesoporous organosilica (Bp-PMO made from 4,4'bis(triethoxysilyl)biphenyl [(C2H5O)3Si-(C6H4)2-Si(OC2H5)3]) was developed. Efficient and secure fixation of the ruthenium(II) complex with methylphosphonic acid groups (RuP2(2+)) in the mesopores of Bp-PMO occurred. This method introduced up to 660 μmol of RuP2(2+) in 1 g of Bp-PMO. Two modes of adsorption of RuP2(2+) in the mesopores of Bp-PMO were observed: one is caused by the chemical interaction between the methylphosphonic acid groups of RuP2(2+) and the silicate moieties of Bp-PMO and the other is attributed to aggregation of the RuP2(2+) complexes. In the case of the former mode, adsorbed RuP2(2+) (up to 80-100 μmol g(-1)) did not detach from Bp-PMO after washing with acetonitrile, dimethylformamide, or even water. Emission from the excited biphenylene (Bp) units was quantitatively quenched by the adsorbed RuP2(2+) molecules in cases where more than 60 μmol g(-1) of RuP2(2+) was adsorbed, and emission from RuP2(2+) was observed. Quantitative emission measurements indicated that emission from approximately 100 Bp units can be completely quenched by only one RuP2(2+) molecule in the mesopore, and photons absorbed by approximately 400 Bp units are potentially accumulated in one RuP2(2+) molecule.
収録刊行物
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- ACS Applied Materials & Interfaces
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ACS Applied Materials & Interfaces 6 (3), 1992-1998, 2014-01-30
American Chemical Society (ACS)
