Simultaneous achievement of antimicrobial property and plant growth promotion using plasma‐activated benzoic compound solution

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  • Naoyuki Iwata
    Department of Electrical and Electronic Engineering, Faculty of Science and Technology Meijo University Nagoya Japan
  • Vladislav Gamaleev
    Department of Electrical and Electronic Engineering, Faculty of Science and Technology Meijo University Nagoya Japan
  • Hiroshi Hashizume
    Department of Electrical Engineering and Computer Science, Graduate School of Engineering Nagoya University Nagoya Japan
  • Jun‐Seok Oh
    Department of Physical Electronics and Informatics, Graduate School of Engineering Osaka City University Osaka Japan
  • Takayuki Ohta
    Department of Electrical and Electronic Engineering, Faculty of Science and Technology Meijo University Nagoya Japan
  • Kenji Ishikawa
    Department of Electrical Engineering and Computer Science, Graduate School of Engineering Nagoya University Nagoya Japan
  • Masaru Hori
    Department of Electrical Engineering and Computer Science, Graduate School of Engineering Nagoya University Nagoya Japan
  • Masafumi Ito
    Department of Electrical and Electronic Engineering, Faculty of Science and Technology Meijo University Nagoya Japan

Abstract

<jats:p>This study assesses a potential use of the recently developed nonthermal atmospheric pressure plasma technology in hydroponic plant cultivation. Two types of plasma‐activated liquid solutions were compared, namely, <jats:sc>l</jats:sc>‐Phenylalanine (<jats:sc>l</jats:sc>‐Phe), which had a benzene ring structure, and <jats:sc>l</jats:sc>‐Alanine (<jats:sc>l</jats:sc>‐Ala), which did not have a benzene ring structure. Antimicrobial property and plant growth enhancement were simultaneously obtained when plasma‐activated <jats:sc>l</jats:sc>‐Phe was used. We found that the benzene ring structure in solution contributed to antimicrobial property. Further, colony forming unit assay indicated that 99% of <jats:italic>Escherichia coli</jats:italic> (<jats:italic>E. coli</jats:italic>) were eliminated after 24‐h incubation and radish sprout growth increased by about 40% after 2 days of cultivation.</jats:p>

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