New model of surface diffusion in reversed-phase liquid chromatography

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Published
2002-06
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  • https://www.elsevier.com/tdm/userlicense/1.0/
  • https://www.elsevier.com/legal/tdmrep-license
DOI
  • 10.1016/s0021-9673(02)00116-4
Publisher
Elsevier BV

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A new model of surface diffusion in reversed-phase liquid chromatography (RPLC) was derived by assuming a correlation between surface and molecular diffusion. Analysis of surface diffusion data under different conditions of sample compounds, mobile and stationary phases, and temperature in RPLC systems validates this assumption and shows that surface diffusion should be regarded as a molecular diffusion restricted by the adsorptive interactions between the adsorbate molecule and the stationary phase surface. A surface-restricted molecular diffusion model was proposed as a first approximation for the mechanism of surface diffusion. The model is formulated according to the absolute rate theory. The activation energy of surface diffusion (Es) was quantitatively interpreted assuming that Es consists of the contributions of two processes, a hole-making and a jumping one. The former contribution is nearly equal to the activation energy of molecular diffusion and is correlated with the evaporative energy of the mobile phase solvent. The latter contribution is a fraction of the isosteric heat of adsorption. An appropriate explanation based on this new model of surface diffusion is provided for two contradictory results related to the relationship between retention equilibrium and surface diffusion in RPLC and to the surface diffusion coefficient for weakly retained sample compounds.

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