Titanium Nitride by XPS

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  • Ingrid Milošev
    Department of Physical and Organic Chemistry, J. Stefan Institute, Jamova 39, 1001 Ljubljana, Slovenia
  • Hans-Henning Strehblow
    Henrich-Heine Universität, Institute of Physical Chemistry and Electrochemistry, Universitätsstr. 1, D-40225 Düsseldorf, Germany
  • Boris Navinšek
    Dept. of Thin Films and Surfaces, J. Stefan Institute, Jamova 39, 1001 Ljubljana, Slovenia
  • Peter Panjan
    Dept. of Thin Films and Surfaces, J. Stefan Institute, Jamova 39, 1001 Ljubljana, Slovenia

Description

<jats:p>Titanium nitride (TiN) coatings have been deposited on polished steel substrates by a plasma-beam sputtering technique in a Sputron apparatus (Balzers A. G.) at 200 °C. A thin intermediate layer of Ti (0.08 μm) was deposited between the substrate and the 2.8 μm thick TiN coating. The average roughness, Ra, of the substrate was &lt;0.04 μm, whereas after the deposition Ra values between 0.06 and 0.08 μm were measured for TiN coatings. Coatings exhibit a fine grain structure of the grain size &lt;100 nm. The XPS measurements were performed in an Escalab 200-X spectrometer (VG Instruments) using non-monochromated Al Kα radiation from a twin Mg/Al anode operating at 300 W. The hemispherical energy analyzer was operated in the CAE mode with a constant pass energy of 20 eV. In the present paper the following spectra are presented: survey spectrum, spectra of major elements titanium and nitrogen (Ti 2p and N 1s), spectra of minor elements oxygen and carbon (O 1s and C 1s), and valence band spectrum. Spectra were background subtracted using a Shirley method. Peak positions and widths were determined from least squares fitting procedure.</jats:p>

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