Electroless deposition of copper in acidic solutions using hypophosphite reducing agent
書誌事項
- 公開日
- 2005-10-08
- 権利情報
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- http://www.springer.com/tdm
- DOI
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- 10.1007/s10800-005-9025-7
- 公開者
- Springer Science and Business Media LLC
この論文をさがす
収録刊行物
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- Journal of Applied Electrochemistry
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Journal of Applied Electrochemistry 36 (1), 69-75, 2005-10-08
Springer Science and Business Media LLC